Ta Sputtering Target, Ta Target, Tantalum Alloy Target Shenzhen Sunrise Metal Industry Co.,Ltd
Tantalum Sputtering Targets,Tantalum alloy targets,Tantalum target
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Material
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Purities
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Application
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Ta
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Tantalum
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3N5
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Electronics & Semiconductor
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Ta
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Tantalum
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3N5
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Displays
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Ta
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Tantalum
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*
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Magnetic Data Storage
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TaAl
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Tantalum Aluminium
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3N5
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Electronics & Semiconductor
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other Ta
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Tantalum / Tantalum alloys
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*
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others
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| Application: | |||||
| Shape: | Material: | Dimensions: | |||
| Chemical Composition: | Technical condition: |
Packaging & Delivery
| Packaging Details: | nutrel exporting package (wooden cases outside with protective materials inside) |
| Delivery Detail: | within 3 days |
Tantalum and tantalum alloy bar
1. Description: Tantalum rods, pole, tantalum alloy bars, tantalum alloy stem
2. Designation: Ta1,Ta2,FTa1,FTa2,R05200,R05400,R05255,R05252,Ta7.5W
3. Technical condition:
GB/T14841-93 ASTM B365-92
4. Application: Being widely used in making heating bodies and shields of vacuum blast, Cooking dish, heater, cooler and various containers in chemical industry, and in the fields of aviation aerospace, medical care instruments etc.
5. Designation, condition and size of Tantalum bar:
Table1
Designation
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Producing way
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Diameter d(mm)
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Diameter and side Length tolerance(mm)
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Length
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Length tolerance
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Forging
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Rolling
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Sanding or machining
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Ta1
Ta2
FTa1
FTa2
R05200
R05400
R05255
(Ta10W)
R05252
(Ta2.5W)
Ta7.5W
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grinding
Machining
Cold rolling
Cold rotaryswaging
Forging
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3.0~4.5
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±0.05
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±0.05
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—
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500~1500
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±5
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>4.5~6.5
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±0.10
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±0.10
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—
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500~1500
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±5
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>6.5~10.0
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±0.15
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±0.15
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±0.15
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400~1500
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±5
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>10~16
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±1.5
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±0.20
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±0.2
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300~1500
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±5
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>16~18
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±2.0
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—
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±0.2
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200~1500
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±20
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>18~25
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±2.5
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—
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±0.3
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200~1500
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±20
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>25~40
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±3.0
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—
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±0.4
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150~1500
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±20
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>40~50
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±3.5
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—
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±0.5
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100~1500
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±20
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>50~65
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±5.0
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—
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±0.6
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100~1500
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±20
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>65~200
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±5.0
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—
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±0.8
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100~1500
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±20
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Note
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The way of sanding and machining will be decided by the required diameter tolerance
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